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All publications for the rubric Electronics (wafers, semiconductors, microchips,...)

The new SensoTech sensor enables continuous inline monitoring of chemical concentrations in semiconductor wet processes. (Image: SensoTech GmbH) The controller visualizes the inline-measured concentrations of, for example TMAH and H₂O₂ as well as the process temperature, in real time. (Image: SensoTech GmbH) The controller visualizes the inline-measured concentrations of, for example TMAH and H₂O₂ as well as the process temperature, in real time. (Image: SensoTech GmbH)
  • Electronics (wafers, semiconductors, microchips,...)

Measure concentrations inline in processes such as SC1, SC2 and BOE

New ultrasonic sensor from SensoTech for semiconductor wet processes

New sensor technology measures critical chemicals directly in the running process and helps semiconductor manufacturers detect process deviations earlier, reduce (lab) effort and run wet processes more stably.

In semiconductor manufacturing, reliable, controlled wet processes determine yield, quality…

Functioning array of qubits with gaps between plunger (P) and barrier (B) gates of barely 6 nanometers, enabled by High NA EUV lithography. The image also shows the accumulation gates (A) and confinement (C).
  • Electronics (wafers, semiconductors, microchips,...)

The most advanced lithography system, crucial for future advanced memory and computer chips, will play a key role in scaling up quantum technology.

World first: imec presents quantum dot qubit device using High NA EUV lithography

    1. Imec presents a world first: a quantum dot qubit device fabricated using High NA EUV lithography.   
2. This demonstration marks a milestone toward the industrial scaling of more reliable qubits, the basic computational units of quantum computers. Quantum computers will perform exponentially bette…

Figure 1 – (a) Schematic of the 3-word-line based 3D CCD structure: bottom gate (BG), center gate (CG), and top gate (TG), with source (S) at the bottom and drain (D) at the top; (b) cross-sectional TEM image showing 3 gate layers with a word-line pitch of 80nm. Figure 2 – (a) Illustration of the pulsing scheme across 3 gates for serial charge transfer in a 3-word-line based 3D CCD memory; (b) Schematic of 3D CCD operation showing electron transfer through the formation and shifting of potential wells under the gates. Figure 3 – (a) I-f characteristics from 7 devices with varying memory hole (MH) diameters, measured up to 4MHz; (b) the number of electrons transferred per cycle obtained from the slope of the corresponding I-f curves.
  • Electronics (wafers, semiconductors, microchips,...)

The feasibility of processing a charge coupled device (CCD) in a 3D NAND-like architecture paves the way for a cost-effective, high-bit-density memory solution to address the memory wall for AI specific workloads

Imec demonstrates the first 3D implementation of a charge coupled device for AI memory applications

– Imec presents the first 3D implementation of a charge coupled device (CCD) with indium-gallium-zinc-oxide (IGZO) channel, with potential for AI memory applications.
– Due to the cost-effective fabrication, high bit density, and block-addressable nature, the 3D CCD device shows promise to be used as…

  • Electronics (wafers, semiconductors, microchips,...)

Expands global ASIC services expertise and aims to take on the industry’s most advanced AI, HPC, mobile and automotive projects

IC-Link by imec joins TSMC 3DFabric® Alliance to accelerate advanced packaging and 3D IC innovation

Imec, a world-leading research and innovation hub in advanced semiconductor technologies, announced that IC-Link by imec, imec’s design and manufacturing service provider for ASIC and silicon photonics, has joined TSMC Open Innovation Platform® (OIP) 3DFabric® Alliance. As part of the TSMC OIP ecosy…

(Copyright: Polytec GmbH)
  • Products, devices, systems, plants for applications

Optical wafer-level characterization of MEMS dynamics with automatic wafer map processing, recipe control, and cleanroom integration into fab-controlled workflows.

Fully automated MEMS vibration analysis in cleanroom: Polytec Micro System Analyzer now with ISO-3 certification and script automation

With the Micro System Analyzers (MSA-600, MSA-650 IRIS, MSA-100-3D), Polytec has been addressing contactless characterization of MEMS dynamics and topography for years – from individual dies to wafer-level testing on probe stations. The current expansion combines this optical measurement technology…

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