- Electronics (wafers, semiconductors, microchips,...)
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Highly precise active alignment solution for optical and semiconductor applications
Innovative positioning system for combined XY and tip/tilt movements
With the MP220-4, Steinmeyer Mechatronik, a company of the Steinmeyer Group, offers a highly precise XYZ Tip-Tilt positioning system for optical and active alignment processes in optics and semiconductor manufacturing, now also suitable for higher loads. The solution combines excellent precision, long service life, and flexible configurability in a very compact design, allowing highly accurate, fast alignment of chucks with submicrometer precision in cleanroom environments. A powerful and cost-optimized alternative to traditional hexapods.
The MP220-4 Miniature XY-Phi-Delta positioning system from Steinmeyer Mechatronik enables small, very precise linear movements in X and Y, as well as rotational corrections around the X and Y axes (Rx/Ry), and is specifically tailored to the requirements of modern semiconductor and optics manufacturing. Designed for industrial 24/7 continuous operation, the aligner features excellent repeatability (± 0.5 µm linear, ± 0.003° rotational), a high load capacity (up to 10 kg), a compact form factor (235 × 220 × 100 mm), and a large through-light aperture (Ø 45 mm). It is an ideal solution for automated active alignment processes, through-light measurements, and optical measurements with active optical paths.
Combined XY, tilting, and Delta movements
The central element is a backlash-free preloaded gimbal kinematic on an XY aperture stage. The four high-resolution precision axes are equipped with lead screw drives from Feinmess Suhl – also part of the Steinmeyer Group – and move the load plate. The load plate can tilt around two axes by 4°, and the underlying aperture-through table provides an XY adjustment of up to 20 mm, of which 10 mm are reserved for purely lateral adjustments. Through its fine-step tilting and XY movement, the XYZ Tip-Tilt system supports active adjustment processes of optics, lasers, and wafer substrates with submicrometer precision. In wafer and die inspection, the open aperture allows continuous optical paths for DUV and EUV illumination, while the mechanical stability guarantees process-safe alignment even under higher loads in multi-layer or packaging applications.
An ideal positioning solution for demanding high-tech processes
Of course, the miniature XY-Phi-Delta positioning system is application-specific scalable and flexibly configurable. Optional features include additional rotation around the main axis (rotary stage), extended XY travel ranges, and configurations for cleanroom environments (up to ISO 4, higher upon request), vacuum (up to 10E-6 mbar, higher upon request), and UV/DUV radiation. Custom development for OEM variants with CAD design, prototyping, and series production is also planned. Thanks to its compact, modular design, the system can be integrated directly into inline production or testing stations.
“With the MP220-4, we offer a compact, economical, and precise alternative to hexapod systems or stacked tables for pure alignment processes that use only small travel ranges – ideal for active alignment processes in semiconductor and optics manufacturing,” summarizes Elger Matthes, Development and Product Management at Steinmeyer Mechatronik, highlighting the advantages.
Steinmeyer Mechatronik GmbH
01259 Dresden
Germany








