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All publications from IMEC Belgium

A diced GaN wafer, similar to what the winners will be able to produce with imec.

19.10.2021
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Award

Contest aims to stimulate innovation in power electronics, leveraging GaN technology to create higher power, smaller and faster components that increase devices’ power density

Imec and EUROPRACTICE announce winners of 2021 GaN-IC technology design contest

Imec, the world-leading research and innovation center in nanoelectronics and digital technologies, and EUROPRACTICE announced today the winners of their 2021 GaN-IC design contest. The contest aims to encourage innovation in power electronics applications using imec’s Gallium Nitride technology for…

A demonstration model of the breath test device developed by imec. (Image: imec)

16.10.2021
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Company

Imec terminates licensing agreement with miDiagnostics regarding the commercialization of its patented technology for rapid and reliable COVID-19 diagnosis via breath analysis

Imec, a globally leading research and innovation center for nanoelectronics and digital technology, and miDiagnostics, a spin-off from imec in collaboration with Johns Hopkins University, which specializes in the development of point-of-care tests for screening, diagnosing, and monitoring a variety…

Imec and Neurogyn AG collaborate on advanced neurostimulation device for pelvic nerve disorders. The new solution aims at prolonging the lifetime of the device while lowering its cost, making it suitable at the point of need.

29.09.2021
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Technology

Imec and NeuroGyn AG are jointly developing an advanced neurostimulation device for disorders of the pelvic nerves

Imec, a globally leading research and innovation center for nanoelectronics and digital technologies, announces a collaboration with NeuroGyn AG, a Swiss medical technology company specializing in neurostimulation and surgical solutions for pelvic nerve disorders, to develop an implantable device of…

The alignment accuracy of the lasers after bonding is within 500 nm in both the x- and y-dimensions.

DFB laser chips, bonded onto a 300-mm silicon photonics wafer.

08.06.2021

Imec Joins Forces With Sivers Photonics and ASM AMICRA to Accelerate Hybrid Integration of InP Lasers and Amplifiers with Silicon Photonics

This week, imec, a world-leading research and innovation center in nanoelectronics and digital technologies, together with Sivers Photonics (formerly CST Global, and a subsidiary of Sivers Semiconductors), a UK-based high-volume manufacturer of III-V compound semiconductors for photonics products, a…

01.06.2021

Flemish competence centers unite their efforts with industry to advance the production of green hydrogen

The Flemish research centers imec and VITO (partner in EnergyVille), together with industry pioneers Bekaert, Colruyt Group, DEME, and John Cockerill, announced today that they are joining forces to invest in green hydrogen production. Under the banner of Hyve, the consortium aims for cost-effective…

Vertical buffer leakage current in forward conduction, measured on 1200V GaN-on-QST® at two different temperatures: (left) 25°C and (right) 150°C. Imec’s 1200V buffer shows a vertical leakage current below 1µA/mm² at 25°C and below 10µA/mm² at 150°C up to 1200V with a breakdown voltage exceeding 1800V at both 25°C and 150°C, making it suitable for the processing of 1200V devices.

30.04.2021

This breakthrough result paves the way for GaN to enter into the SiC high voltage domain

Imec and AIXTRON Demonstrate 200 mm GaN Epitaxy on AIX G5+ C for 1200V Applications with Breakdown in Excess of 1800V

Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and AIXTRON, the leading provider of deposition equipment for compound semiconductor materials, have demonstrated epitaxial growth of gallium-nitride (GaN) buffer layers qualified for 1200V applications on…

The Neuropixels 2.0 probe (bottom) is smaller than the first generation (top) and can monitor neural activity over weeks.

25.04.2021

A new generation of miniature recording probes can track the same neurons inside tiny mouse brains over weeks — and even months

Latest Neuropixels probes can track neurons over weeks

The new tools build on the success of the original Neuropixels probes released in 2017 and currently used in more than 400 labs. Neuropixels 2.0 are much smaller — about a third the size of their predecessors. They’re designed to record the electrical activity from more individual neurons and have t…

Opto-mechanical ultrasound sensor array chip with fiber optic array access.

Close-up of the opto-mechanical ultrasound sensor wafers.

Opto-mechanical ultrasound sensor wafer.

19.03.2021

Imec demonstrates an ultra-sensitive, compact optomechanical ultrasound sensor based on silicon photonics

Imec, a globally leading research and innovation center for nanoelectronics and digital technologies, presents an optomechanical ultrasound sensor on a silicon photonics chip, which exhibits unprecedented sensitivity thanks to an innovative optomechanical waveguide. Due to this highly sensitive wave…

Top-down (left) and cross-sectional (right) REM images of an 18-nm line/space pattern after high-Ï-DSA and subsequent etching into a target SiN layer.

01.03.2021

Imec demonstrates 18nm pitch line/space patterning using a high-chi directed self-assembly process

This week, at the SPIE Advanced Lithography Conference 2021, imec, a globally leading research and innovation center for nanoelectronics and digital technologies, demonstrated for the first time the capability of Directed Self Assembly (DSA) to pattern lines/spaces with a pitch of only 18 nm, using…

28nm pitch single-exposure patterning using Inpria’s MOx process on a 0.33NA EUV full field scanner after Ru metallization.

24nm pitch lines/spaces achieved on a 0.33NA NXE:3400B full-field scanner, (left) after development and (right) after etching at the critical dimension (CD) (uLER = unbiased line-edge roughness).

28nm contact holes, achieved with a 0.33NA NXE:3400 full-field scanner, after development.

23.02.2021

Proven correlation between morphological and electrical data on 28nm pitch line/spaces increases understanding of stochastic defectivity impact on device reliability/yield

Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits

This week, at the 2021 SPIE Advanced Lithography Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML, the world’s leading manufacturer of semiconductor lithography equipment, present several papers that demonstrate the ultimate single-e…

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