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All publications from IMEC Belgium

Opto-mechanical ultrasound sensor array chip with fiber optic array access.

Close-up of the opto-mechanical ultrasound sensor wafers.

Opto-mechanical ultrasound sensor wafer.

19.03.2021

Imec demonstrates an ultra-sensitive, compact optomechanical ultrasound sensor based on silicon photonics

Imec, a globally leading research and innovation center for nanoelectronics and digital technologies, presents an optomechanical ultrasound sensor on a silicon photonics chip, which exhibits unprecedented sensitivity thanks to an innovative optomechanical waveguide. Due to this highly sensitive wave…

Top-down (left) and cross-sectional (right) REM images of an 18-nm line/space pattern after high-Ï-DSA and subsequent etching into a target SiN layer.

01.03.2021

Imec demonstrates 18nm pitch line/space patterning using a high-chi directed self-assembly process

This week, at the SPIE Advanced Lithography Conference 2021, imec, a globally leading research and innovation center for nanoelectronics and digital technologies, demonstrated for the first time the capability of Directed Self Assembly (DSA) to pattern lines/spaces with a pitch of only 18 nm, using…

28nm pitch single-exposure patterning using Inpria’s MOx process on a 0.33NA EUV full field scanner after Ru metallization.

24nm pitch lines/spaces achieved on a 0.33NA NXE:3400B full-field scanner, (left) after development and (right) after etching at the critical dimension (CD) (uLER = unbiased line-edge roughness).

28nm contact holes, achieved with a 0.33NA NXE:3400 full-field scanner, after development.

23.02.2021

Proven correlation between morphological and electrical data on 28nm pitch line/spaces increases understanding of stochastic defectivity impact on device reliability/yield

Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits

This week, at the 2021 SPIE Advanced Lithography Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML, the world’s leading manufacturer of semiconductor lithography equipment, present several papers that demonstrate the ultimate single-e…

23.02.2021

Collaboration between Sarcura and imec aims to develop a silicon photonics-based cytometry solution allowing real-time process control and manipulation of cells.

SARCURA and imec to collaborate on high throughput cytometry solution for automated (T-)cell separation, tackling manufacturing challenges of cell and gene therapies

Sarcura GmbH, an Austrian early-stage technology startup, today announced that it has entered a collaboration with imec, a world-leading research and innovation hub in nanoelectronics and digital technologies to develop a silicon chip-based prototype of a cytometer for automated cell separation brin…

Schematic representations (not to scale) of (left) Lloyd's mirror setup for high-NA EUV interference coupon experiments and (right) interference chamber for full-wafer experiments.

(Links) Cross-sectional SEM image of a 20-nm L/S pattern on an Inpria metal-oxide resist, exposed in a Lloyd's mirror interference setup at a dose of 64 mJ/cm² and an interference angle of 20°. (Right) Fourier transform analysis, where 0.05 = 20 nm pitch.

10.02.2021

The achievement marks a major milestone of imec and KMLabs’ AttoLab

Imec Demonstrates 20nm Pitch Line/Space Resist Imaging with High-NA EUV Interference Lithography

Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, reports for the first time the use of a 13.5 nm High Harmonic Generation source for the printing of 20nm pitch line/spaces using interference lithographic imaging of an Inpria metal-oxide resist under high…

SWIR images for 3 different pixel pitches. The images with the highest resolution could be captured with the smallest (1.82 µm) pixel pitch.

The thin-film photodetector was monolithically integrated on a custom Si-CMOS readout circuit. (Source: Imec)

08.12.2020

The monolithic integration of the thin-film photodetector with CMOS readout circuitry offers a path to high-throughput wafer-level manufacturing

Imec Presents a Thin-Film Short-Wave-InfraRed Image Sensor with Sub-2µm Pixel Pitch

Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents a prototype high-resolution short-wave-infrared (SWIR) image sensor with record small pixel pitch of 1.82 µm. It is based on a thin-film photodetector that is monolithically integrated on a custom…

02.11.2020

The groundbreaking approach will use virus particles in exhaled air for rapid, simple, convenient, and large-scale testing

Imec begins developing a SARS-CoV-2 test to identify positive cases and confirm within less than five minutes whether someone is contagious.

Imec, a globally leading research and innovation center for nanoelectronics and digital technologies, announced that it has begun developing a groundbreaking SARS-CoV-2 test. Unlike current approaches (using blood, saliva, or a nasal-throat swab), the new test will identify SARS-CoV-2 virus particle…

25.06.2020

Deltaray enables zero-defect product manufacturing

Deltaray, a spin-off of Antwerp University and imec – a world-leading research and innovation hub in nanoelectronics and digital technologies – is taking quality control to the next level with the introduction of its ‘Accelerated 3D XRAY’ technology. Deltaray’s solution allows manufacturers to inspe…

19.01.2020

Evonetix collaborates with imec to expand the production of chip-based technology for the third-generation DNA synthesis platform.

EVONETIX LTD ('Evonetix'), the synthetic biology company developing a desktop platform for scalable, high-resolution, and rapid gene synthesis, announced today that it has entered into a partnership with imec, a globally leading research and innovation center active in the fields of nanoelectronics…

The groundbreaking idea of the NOTICE project is to use a novel stable oxide material as the basis for both the superconductor and topological insulator material. At the epitaxial interface, Majorana fermions – building blocks for fault-tolerant qubits – will be generated.

11.12.2019

Prestigious European ERC Consolidator Grant awarded to imec’s Clement Merckling for developing fault-tolerant Qubits

Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, today announces that the European Research Council has awarded Clement Merckling, principal member of technical staff at imec, a Consolidator Grant for working out his project NOTICE. Groundbreaking idea o…

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