AIST develops graphene on 300 mm wafers with AIXTRON equipment

AIST develops graphene on 300 mm wafers with AIXTRON equipment

The National Institute of Advanced Industrial Science and Technology (AIST) in Japan has successfully commissioned an AIXTRON BM 300 system. The system was installed in 2011 by AIXTRON's service team in the cleanroom of the Japanese institute in Tsukuba. During the MRS Spring Conference 2012, AIST group leader Dr. Shintaro Sato presented the results on April 10th.

"With the deposition of graphene monolayers on 300 mm wafers at AIST, we have achieved the next important milestone," explained Dr. Ken Teo, Director of the Nanoinstrumentation Division at AIXTRON. "The BM 300 is the most advanced technology for the production of graphene." In addition to a state-of-the-art system for extremely precise gas delivery of the raw materials, it is standardly equipped with an ARGUS in-situ pyrometer for surface temperature measurement, a heating system for optimal temperature distribution on the wafer, and a transfer module for automatic wafer loading. "The extraordinarily precise control and high reproducibility of the system on 300 mm graphene wafers are essential to enable large-scale graphene deposition," continued the AIXTRON expert. "This has laid the foundation for fully utilizing the unique properties of this material in the manufacturing of the next generation of semiconductor devices."

The team led by Dr. Sato will deposit high-quality graphene with a controlled number of layers — a crucial prerequisite for producing CMOS field-effect transistors with low operating voltages below 0.3 volts using this process technology.

The project is supported by funding from the FIRST1 program. By providing research results, FIRST supports future-oriented research initiatives that contribute to strengthening Japan's competitiveness in the global market and benefit society and the population. The program was approved in 2009 by the Council for Science and Technology Policy (Cabinet Office of the Japanese government) and the Japan Society for the Promotion of Science.

The wafer processing takes place in collaboration with the GNC (Green Nanoelectronics Center) affiliated with AIST, led by Dr. Naoki Yokoyama, as part of the research project "Development of key technologies for green nanoelectronics," which is also funded by FIRST. The GNC has been in operation since April 2010 and employs scientists from institutional and industrial research.

1 FIRST, Funding Program for World-Leading Innovative R&D on Science and Technology = Funding program for globally leading innovative scientific and technological research & development.

Image: AIXTRON BM 300 with automatic wafer loading