Here you can find the NEWSLETTER archive More ...
Buchta C-Tec Ecolab PMS

cleanroom online
Deutsch   English


  • Electronics (wafers, semiconductors, microchips,...)

State-of-the-art electron beam lithography system for Jenoptik’s high-tech fab in Dresden

Investment in new production tool for the semiconductor equipment industry.

Konzeptbild der neuen Fab. © studiobrand.3dvisuals / Concept image of the new high-tech fab. © studiobrand.3dvisuals
Konzeptbild der neuen Fab. © studiobrand.3dvisuals / Concept image of the new high-tech fab. © studiobrand.3dvisuals

Jenoptik is investing a low double-digit million-euro amount in a state-of-the-art system for the high-tech fab currently under construction in Dresden. The new electron-beam lithography system (E-Beam) will be used to manufacture high-precision micro-optical components for customers in the semiconductor and optical communication sectors. The manufacturer is the Jena based e-beam technology specialist Vistec Electron Beam GmbH. The system will be delivered at the beginning of 2025.

Creating the smallest structures with maximum precision

This type of electron-beam lithography system can "write" structures with a precision in the 10-nanometer range (approximately 1/2,000th of a hair) on substrates up to 300 mm in diameter.

The Vistec SB3050-2 electron-beam lithography system is based on the so-called Variable Shaped Beam principle, with which even large areas can be structured highly accurately and effectively. The high degree of automation, combined with flexibility in terms of usable substrates, are further features of the Vistec SB3050-2 that enable it to be used in an industrial environment. The system is equipped with Cell Projection functionality, opening up further possibilities for applications in micro-optics.

Jenoptik has been active in Dresden since 2007. With the new high-tech fab at Airportpark Dresden, the company is consolidating its production, which is currently spread across several small external sites, while at the same time expanding its capacities. The clean room production in the new fab will cover 2,000 square meters with clean room areas of classes ISO 5 and 3 and meet the highest requirements for freedom from vibrations and temperature stability.

High environmental standards are taken into account for the entire fab: Jenoptik is striving to fulfill the currently most comprehensive and stringent building criteria in terms of sustainability with the "KfW 40 Standard" and the "LEED Gold Standard Certification". At the same time, high-quality jobs will be created and the number of employees on site will increase to a total of more than 120. The Saxon state capital will thus become the main location for the micro-optics sector.


JENOPTIK AG
07743 Jena
Germany


Better informed: With YEARBOOK, NEWSLETTER, NEWSFLASH and EXPERT DIRECTORY

Stay up to date and subscribe to our monthly eMail-NEWSLETTER and our NEWSFLASH. Get additional information about what is happening in the world of cleanrooms with our printed YEARBOOK. And find out who the cleanroom EXPERTS are with our directory.

MT-Messtechnik ClearClean PPS HJM