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- Electronics (wafers, semiconductors, microchips,...)
First electrical tests at 20nm pitch present a next milestone in validating the High NA extreme ultraviolet (EUV) patterning ecosystem
Imec demonstrates electrical yield for 20nm pitch metal lines obtained with High NA EUV single patterning
This week at SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography…