SUSS MicroTec hosts Technology Forum Nanoimprint in Grenoble

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, will host a technology forum for nanoimprint lithography in Grenoble on June 24, 2014. The one-day workshop covers trends and latest findings in nanoimprint lithography presented by experts from research and industry. The workshop offers the possibility to visit the clean room facilities at CIME nanotech (Centre Interuniversitaire de MicroElectronique et Nanotechnologies). 

To register for the technology forum nanoimprint, please visit: www.suss.com

Nanoimprint lithography (NIL) is a versatile enabling nano manufacturing technology, which has been included on the ITRS Lithography Roadmap at the 32 and 22nm nodes. This technology has been shown to be an effective method for replication of nanometer-scale structures from a template. As a highly reliable replication process, the resolution of imprint lithography is determined by the ability to create a master template having the required dimensions. NIL has already demonstrated sub-50nm resolution at low costs and is expected to play a leading role in the commercialization of nanostructures. SUSS MicroTec equipment supports new, cost-effective micro/nano-Replication technologies, such as nanoimprinting with UV and single imprinting for small and large areas.

“The SUSS Technology Forum is our workshop platform with an excellent acceptance worldwide. Many customers and partners use this opportunity for both information and networking.” says Frank P. Averdung, President and CEO of SUSS MicroTec. “ As nanoimprinting is considered as versatile key technology for many applications we are looking forward to lively discussions.”