Araca and Levitronix Partner to Distribute Araca’s CMP Slurry Injection System

Levitronix Technologies LLC, a leading supplier of fluid handling components to the semiconductor industry, has signed a distribution agreement with Araca Inc., a
leading provider of products and services for chemical mechanical planarization (CMP) research and development. The agreement gives Levitronix the exclusive worldwide rights to sell Araca’s CMP Slurry Injection System for Applied Materials® Reflexion® LK polishers (SIS-RLK). The product can be seen during Semicon Taiwan (Sep. 4-6, 2013) at the Levitronix booth.

“Leading-edge device designs and materials are introducing more complexity into planarization processing for manufacturers. This is increasing wafer costs and impacting die yields,” said Dr. Ara Philipossian, president and founder of Araca, Inc. “Our CMP Slurry Injection System (SIS) helps device manufacturers to increase removal rates while reducing polishing defects and slurry consumption for CMP processes. Partnering with Levitronix allows us to offer these benefits to device
manufacturers worldwide and to give them the best possible product support. We anticipate this agreement will expand our presence into the semiconductor industry by leveraging Levitronix’ leading market position in CMP slurry pumps, along with its extensive global customer sales and support infrastructure.”

“Consumables cost and defects are major obstacles in CMP, in addition to process variations that arise from fluctuations in slurry flow, slurry distribution on the pad, dilution with rinsing water and particle agglomerations,” said Dr. Reto Schoeb, CEO of Levitronix. “For more than 10 years, Levitronix has designed and sold pumps, flow-controllers and other components to help semiconductor device manufacturers controlling these parameters. Araca’s CMP Slurry Injection System ideally
complements our product line and will allow us to offer further CMP process improvements to our customers.”