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Vaisala MT-Messtechnik C-Tec Systec & Solutions GmbH



The cleanroom at Imec forms the basis for NanoIC's PDKs, which are based on 2-nm process flows. (Image: Imec) / Imec's cleanroom provides the foundation for NanoIC's PDKs, based on 2 nm process flows. (Photo: Imec)
  • Workshop / Course

Major update of NanoIC’s Pathfinding N2 P-PDK empowers researchers and designers to learn and innovate on full SoC architectures

NanoIC adds advanced SRAM memory macros to its N2 pathfinding PDK

NanoIC pilot line, a European initiative coordinated by imec and dedicated to accelerating innovation in chip technologies beyond 2nm, announces the release of the N2 P-PDK v1.0, an important update of its N2 Pathfinding Process Design Kit (P-PDK). This new version introduces several new features, i…

Figure 1 – (Left) Transfer curves of 2D-pFET devices using defect-passivated synthetically-created bi-layer WSe2 films, with the best device showing Imax = 690µA/µm; (Right) TEM cross-section of the finalized dual-gated 2D pFET (Lch=channel length; TG=Top Gate; BG=Back Gate; S=Source; D=Drain; IL=Interlayer), in collaboration with TSMC. Figure 2 – (a) Dry etching into SiO₂; (b) Dry and wet etching, which stops selectively on the WS₂ monolayer channel, also removing the AlOx interlayer laterally along the entire channel length (in collaboration with Intel).
  • Electronics (wafers, semiconductors, microchips,...)

Collaboration with leading semiconductor manufacturers pivotal in optimizing the key modules for 2D-material device integration

Imec advances 2D-material based device technology beyond state of the art in support of the future logic technology roadmap

– Imec, in collaboration with leading semiconductor manufacturers, addressed key challenges in advancing 2D-material device technology, which is considered a long-term option for extending the logic technology roadmap.
– Collaboration with TSMC resulted in record performing WSe2 -based pFETs (with Im…

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