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ClearClean Hydroflex Buchta Systec & Solutions GmbH



Figure 1 – Top-down SEM images of meanders (left) and forks (right) with a 20 nm pitch after pattern transfer into a TiN hard mask. Figure 2 – TEM image of metallized wires with a 20 nm pitch after a chemical-mechanical polishing (CMP) process.
  • Electronics (wafers, semiconductors, microchips,...)

First electrical tests at 20nm pitch present a next milestone in validating the High NA extreme ultraviolet (EUV) patterning ecosystem

Imec demonstrates electrical yield for 20nm pitch metal lines obtained with High NA EUV single patterning

This week at SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography…

  • Trade fair

ChemE Show – Powered by ACHEMA will take place for the first time in Houston, Texas, in 2026

DECHEMA and Gulf Energy Information partner to launch leading US event for process technology

DECHEMA – organizers of the world’s leading trade show for the Process Industries ACHEMA – and Gulf Energy Information are thrilled to announce a groundbreaking partnership to launch the new annual must-attend event for experts, decision-makers and solution providers along the chemical and bio-based…

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Piepenbrock Becker PMS HJM