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All publications from IMEC Belgium

A demonstration model of the breath test device developed by imec. (Image: imec)
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Imec terminates licensing agreement with miDiagnostics regarding the commercialization of its patented technology for rapid and reliable COVID-19 diagnosis via breath analysis

Imec, a globally leading research and innovation center for nanoelectronics and digital technology, and miDiagnostics, a spin-off from imec in collaboration with Johns Hopkins University, which specializes in the development of point-of-care tests for screening, diagnosing, and monitoring a variety…

Vertical buffer leakage current in forward conduction, measured on 1200V GaN-on-QST® at two different temperatures: (left) 25°C and (right) 150°C. Imec’s 1200V buffer shows a vertical leakage current below 1µA/mm² at 25°C and below 10µA/mm² at 150°C up to 1200V with a breakdown voltage exceeding 1800V at both 25°C and 150°C, making it suitable for the processing of 1200V devices.

This breakthrough result paves the way for GaN to enter into the SiC high voltage domain

Imec and AIXTRON Demonstrate 200 mm GaN Epitaxy on AIX G5+ C for 1200V Applications with Breakdown in Excess of 1800V

Imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and AIXTRON, the leading provider of deposition equipment for compound semiconductor materials, have demonstrated epitaxial growth of gallium-nitride (GaN) buffer layers qualified for 1200V applications on…

The Neuropixels 2.0 probe (bottom) is smaller than the first generation (top) and can monitor neural activity over weeks.

A new generation of miniature recording probes can track the same neurons inside tiny mouse brains over weeks — and even months

Latest Neuropixels probes can track neurons over weeks

The new tools build on the success of the original Neuropixels probes released in 2017 and currently used in more than 400 labs. Neuropixels 2.0 are much smaller — about a third the size of their predecessors. They’re designed to record the electrical activity from more individual neurons and have t…

28nm pitch single-exposure patterning using Inpria’s MOx process on a 0.33NA EUV full field scanner after Ru metallization. 24nm pitch lines/spaces achieved on a 0.33NA NXE:3400B full-field scanner, (left) after development and (right) after etching at the critical dimension (CD) (uLER = unbiased line-edge roughness). 28nm contact holes, achieved with a 0.33NA NXE:3400 full-field scanner, after development.

Proven correlation between morphological and electrical data on 28nm pitch line/spaces increases understanding of stochastic defectivity impact on device reliability/yield

Imec Pushes Single-Exposure Patterning Capability of 0.33NA EUVL to its Extreme Limits

This week, at the 2021 SPIE Advanced Lithography Conference, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and ASML, the world’s leading manufacturer of semiconductor lithography equipment, present several papers that demonstrate the ultimate single-e…

Collaboration between Sarcura and imec aims to develop a silicon photonics-based cytometry solution allowing real-time process control and manipulation of cells.

SARCURA and imec to collaborate on high throughput cytometry solution for automated (T-)cell separation, tackling manufacturing challenges of cell and gene therapies

Sarcura GmbH, an Austrian early-stage technology startup, today announced that it has entered a collaboration with imec, a world-leading research and innovation hub in nanoelectronics and digital technologies to develop a silicon chip-based prototype of a cytometer for automated cell separation brin…

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