Analytik Jena presents new ICP-OES device series PlasmaQuant 9200

Analytik Jena, a leading provider of analytical measurement technology, is expanding its portfolio in chemical element analysis with the new ICP-OES series PlasmaQuant 9200. The devices combine market-leading spectral resolution with high matrix tolerance and enable precise analyses even with complex samples. With the most compact footprint in their class, they also set new standards in laboratory efficiency. The series is designed for high-resolution determination of various elements – especially in complex matrices, such as organic ones. This makes the PlasmaQuant 9200 ideal for applications in research, trace analysis, and quality control.

Analytically versatile

The standard version PlasmaQuant 9200 offers a resolution of 6 pm @ 200 nm and is tailored for routine use in contract and quality control laboratories. The device variant PlasmaQuant 9200 Elite achieves a resolution of 2 pm @ 200 nm and is designed for particularly demanding samples – for example, in galvanization/metallurgy and specialty chemical industries. A broad spectral range from 160 to 900 nm, low detection limits, and high long-term stability enable reliable results across a variety of applications – from battery production to petrochemicals to ore and metal analysis.

Efficient space-saving design

The size of the new instrument has been reduced by more than 40 percent compared to the previous model – making it the most compact footprint on the ICP-OES market. With only 60 cm in width, it allows efficient use of often limited laboratory space. Thanks to a startup time of less than ten minutes, the device is ready for use very quickly, significantly speeding up workflows. With a robust plasma source of up to 1,700 watts, it reliably handles challenging matrices as well.

Reliable and flexible

The PlasmaQuant 9200 series offers user-friendly operation, high application safety, and flexible deployment options. With the modular V Shuttle Torch, users can freely select the torch components according to their sample requirements. The integrated Dual View Plus technology enables an optimized choice of observation mode, reducing repeat measurements. Additionally, customizable service agreements from Analytik Jena support the reliable operation of the systems in daily laboratory use.